The New Exposure Photography Competition was developed in 2012 to discover the talented image-makers who will shape the world of fashion in years to come. An esteemed panel of industry experts convened at Bottega Veneta’s studio in New York City to narrow the 650 entries received down to 10 U.S. finalists and 10 international finalists.


The winners are:

U.S. – Matin Zad
International – Jorgen Axelvall